First-principles Calculation
● Computaional Resources: OSU high performance computer cluster (see OSU HPC capabilities)
● Software: Vienna Ab Initio Simulation Package (VASP)
Thin Film Deposition
● Pulsed Laser Deposition (PLD): Our PLD system includes (1) KrF Excimer 248 nm laser for target ablation, (2) Neocera PLD vacuum chamber for oxide deposition, and (3) high-pressure RHEED system for in-situ monitoring of film growth.
● Targets for PLD will be fabricated using the bulk synthesis tools at OSU Advanced Technology and Manufacturing Institute (see OSU ATAMI capabilities)
● PLD chambers for sulfide deposition, sputtering deposition, thermal evaporation, e-beam evaporation, and chemical vapor deposition are available in OSU Materials Synthesis and Characterization Facility (see OSU MASC capabilities)
Thin Film Characterization
● Rigaku XRD facilities for thin-film and powder measurements (see OSU X-ray Diffraction Facilities)
● AFM, PFM, and MFM are available for shared research facilities
Device Fabrication and Electrical Test
● Photolithography, plasema etch, and surface treatment tools in OSU cleanroom
● Four probe station with heated chuck
● Agilent Technologies Semiconductor Parameter Analyzer and Prevision LCR Meter for I-V, C-V, and pulse measurement